What Is a Plasma Cleaning System?
A plasma cleaning system is a high-performance device that irradiates plasma onto the surface of a material to perform tasks, such as cleaning, sterilization, and coating.
Plasma is a special gas state containing charged particles generated by giving energy to a gas, and is characterized by its extremely high reactivity with molecules.
The effectiveness of plasma cleaning systems depends on the type of gas used and the method used to generate the plasma.
For example, plasmaizing gases such as oxygen and nitrogen produces cleaning and sterilizing effects on material surfaces. The plasmaization of gases, such as silicon and fluorine, can form a coating layer on the material surface.
When considering the use of plasma cleaning systems, it is important to select the appropriate system for the purpose and application. For example, in the medical equipment and food processing industries, the emphasis should be on cleaning and sterilization, while in fields where wear and chemical resistance are required, the emphasis should be on coating performance.
Uses of Plasma Cleaning Systems
Plasma cleaning systems utilize plasma with high energy and reactivity and are used in diverse industrial fields. They are used in a wide range of applications, from areas requiring advanced technology to environmental and sanitary aspects.
The cleaning, film formation, and etching capabilities of plasma cleaning systems are particularly useful in the manufacture of semiconductor integrated circuits and other precision equipment components. As a result, products are produced quickly and with high quality, contributing to the development of advanced technologies.
Plasma cleaning systems can also be used to detoxify industrial waste. They can decompose hazardous substances and minimize their impact on the environment. Furthermore, they are also used to disinfect and sterilize food and chemicals, contributing to improved safety.
Principle of Plasma Cleaning Systems
As the temperature of a substance rises, its state changes from solid to liquid and from liquid to gas. As the temperature of a gas rises, the electrons in the atoms separate into positive ions and electrons. This phenomenon is called ionization, and the gas in a high-energy state created by ionization is plasma.
There are two main types of plasma cleaning systems: atmospheric pressure plasma systems and low-pressure plasma systems.
1. Atmospheric Pressure Plasma Cleaning System
As the name suggests, atmospheric pressure plasma cleaning systems generate plasma under atmospheric pressure. Plasma is generated by passing rare gases or oxygen through electrodes to which high voltage is applied.
A vacuum environment is not required, and the ion density is higher than that of low-pressure plasma. However, the disadvantage is that the object must be as close to the irradiation position as possible.
2. Low-Pressure Plasma Cleaning System
Low-pressure plasma cleaning systems generate plasma in a vacuum environment. Although its use is limited to a vacuum environment, it does not require gas. Also, the device can be irradiated at a certain distance from the object, so there is no need to worry about the installation location of the device.
Other Information on Plasma Cleaning Systems
Machines Used in Conjunction With Plasma Cleaning Systems
Plasma technology is mainly used in conjunction with vacuum chambers, electrode systems, and gas supply systems.
1. Vacuum Chamber
Most plasma processing takes place inside a vacuum chamber. The vacuum chamber creates a suitable environment for plasma generation by shutting off the outside gas and filling it with a specific gas inside.
Plasma generated inside the vacuum chamber can be used for cleaning, etching, coating, and other processes.
2. Electrode System
Plasma is generated by giving electromagnetic waves or an electric field to a gas. Therefore, the electrode device used in conjunction with the plasma cleaning system plays an important role.
The electrode cleaning system supplies the appropriate energy to the gas and facilitates plasma formation. The shape and arrangement of the electrode system affect the characteristics of the plasma cleaning system and the processing method, so it is important to select the appropriate electrode system.
3. Gas Supply Equipment
A variety of gases are used in plasma cleaning systems. The gas supply equipment will supply the necessary gases in the vacuum chamber at the appropriate flow rate and pressure. The type and amount of gas supplied will affect the plasma properties and reaction rate, so the accuracy of the gas supply system directly affects the quality of the plasma process.